Just a quick note that I will be in Chicago from September 29th – October 1st, 2010 during the APLF Annual Meeting. (I will be participating in the Social Networking for the IP Lawyer session).
Here is some information on the session if you are interested in attending:
Social Networking for the IP Lawyer: For Profit or Pleasure?
As media users… Should IP professionals be using social networking sites for expertise building, business development, marketing, networking and recruiting? If so, how and to what degree? We will explore strategies that are being used to increase personal and firm visibility in the on-line community. Practical tips for professionals who want to build a referral network on LinkedIn, Google and other networks. The pros and cons of Facebook and tweeting to attract new business. Should these be firm or individual initiatives? These are some of the topics that will be explored.
Legal Responsibilities of Social Networking
As IP lawyers… Social networking and other online media raise a host of legal issues and potential liabilities that are familiar to IP lawyers, including the potential for trademark and copyright infringement, violations of rights of publicity, defamation and disclosure of trade secrets. How can you deal with these issues and what advice should lawyers give on internal policies, privacy, electronic discovery and employment law ramifications of social media?
- Dennis Crouch, Editor, Patently-O Weblog, Associate Professor, University of Missouri School of Law (invited)
- Marcus Gallie, Ridout & Maybee LLP
- Karen G. Hazzah, Thomas, Kayden, Horstemeyer & Risley, LLP
- Leigh Ann Lindquist, Sughrue Mion, PLLC
- Renee Quinn, IP Watchdog.com
- Samantha Collier, MBM Intellectual Property Law, LLP
The brochure for the event can be found here. I look forward to seeing some of you there!
Photo Cred: shinemy